PROJECTS

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PROJECTS

GEOMETRIC MEASUREMENT

CTE measurement

작성자 관리자 날짜 2024-08-26 11:09:36 조회수 75
Measurement of the coefficient of thermal expansion of the substrate according to temperature change
Application Cases

Measurement target

   - 6" ~ 12" wafer

Measurement repeatability

   - σ < 0.05µm

Temperature control range

   - -40 ~ 200℃ (based on wafer chuck top surface)

Temperature uniformity

   - ±1℃ @100℃ (based on wafer chuck top surface)

Measurement method

   - Image Processing

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